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Definition | : | Extreme UltraViolet Lithography |
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Extreme Ultraviolet Lithography (EUVL) is an advanced semiconductor manufacturing technology used in the production of Integrated Circuits (IC).
EUVL is a type of photolithography that uses Extreme Ultraviolet (EUV) light with wavelengths in the range of 13.5 nanometers (nm) to create intricate patterns on silicon wafers.
Note:
EUV has a much shorter wavelength compared to the ultraviolet light used in previous lithography technologies. The shorter wavelength enables higher precision in etching smaller features on the silicon wafer.
Euroopan Unionin Virallinen Lehti
[Official Journal of the European Union]
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The full form of EUVL is Extreme UltraViolet Lithography
Extreme UltraViolet Lithography