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Definition | : | Extreme UltraViolet |
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Extreme Ultraviolet (EUV) refers to a range of electromagnetic radiation with wavelengths in the extreme ultraviolet part of the electromagnetic spectrum.
EUV range typically spans from about 10 to 121 nanometers (nm).
EUV lithography is an advanced technology used for the fabrication of Integrated Circuits (IC).
Extreme Ultraviolet Lithography (EUVL), also known as EUV lithography, is a type of photolithography that utilizes EUV light, which has significantly shorter wavelengths compared to traditional Deep Ultraviolet (DUV) lithography. This enables the creation of even smaller and more intricate patterns on semiconductor wafers.
Note:
Photolithography is a technology that uses light to transfer intricate patterns onto a substrate, typically a silicon wafer in the context of semiconductor manufacturing.
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The full form of EUV is Extreme UltraViolet
Extreme UltraViolet | Electric Utility Vehicle