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| Definition | : | Capacitively Coupled Plasma |
| Category | : | Academic & Science » Electronics |
| Country/ Region |
: | Worldwide
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| Popularity | : |
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| Type | : |
Initialism
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Capacitively Coupled Plasma (CCP) is a type of industrial plasma source used for dry-etching and deposition of materials for microelectronics fabrication.
The full form of CCP is Capacitively Coupled Plasma
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